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Welcome to Vistec Electron Beam GmbH

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, mask making as well as integrated optics and photonics.

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Next Events

  • Yokohama, Japan

    PMJ

    24th international symposium on photomasks and NGL masks in Japan

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  • Dresden, Germany

    EMLC

    33rd European Mask and Lithography Conference

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