Vistec - a provider of electron-beam technology

Welcome to Vistec Electron Beam GmbH

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, mask making as well as integrated optics and several new emerging markets. Among standardized and proven systems, Vistec Electron Beam also provides customized solutions according to special technology requirements.

Events:

04-15-2014 - 04-17-2014 Yokohama, Japan

> Photomask Japan

The 21st Symposium on Photomask and Next Generation Lithography Mask Technology

05-14-2014 - 05-15-2014 Moscow, Russia

> Semicon Russia

The leading Forum and Exhibition for Microelectronics and Semiconductor Manufacturing in Russia!

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