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Applications

Electron-beam lithography has long been established as a very flexible and reliable technology for a wide range of existing as well as emerging semiconductor and nanotechnology applications.

This is not only true in research and development but also in semiconductor manufacturing. It is a proven technology in the manufacturing of semiconductor devices, for the generation of masks for optical lithography as well as for electron-beam direct write.

With regard to optics high resolution nano-patterning has a huge potential for the generation and implementation of novel optical functions. In the following some exclusive examples are highlighted.

Our Applications

Teaserimage Gratings

Optics

Optics
Teaserimage III-V Device

Compound Semiconducter

Compound Semiconducter
Teaserimage Mask Patterning

Mask writing

Mask writing
Teaserimage Semiconductor

Nano Imprint

Nano Imprint
Teaserimage Cell Projection

EBDW

EBDW
Teaserimage Resolution Capability

Nano Lithography

Nano Lithography