Contact

EBDW

Cell Projection

Teaserimage Cell Projection

Cell Projection using 1.5 μm x 0.75 μm cell size
System: Vistec SB3054
Source: STMicroelectronics, CEA-LETI, France

Early Device Evaluation

Teaserimage Early Device-Evaluation

32 nm hp Device Cell Exposure
System: Vistec SB3054
Source: CEA-LETI, France

300mm CMOS full chip patterning

Teaserimage 300mm CMOS Chip Patterning

Integration into 28nm BEOL SRAM technology
System: Vistec SB3050
Source: Fraunhofer IPMS CNT