History
The company roots go back to Carl Zeiss Jena and Cambridge Instruments and their long and successful histories. Back in the 1950's both Carl Zeiss Jena in Germany as well as Cambridge Instruments started projects for the development of commercial electron-beam equipment.
In 1974, the first commercial Shaped Beam system was launched based on fundamental patents still held by Vistec. With regard to Gaussian Beam, Cambridge Instruments Ltd. and its strong partnership with Cambridge University as well as to the Electron Beam Lithography Group of Philips Eindhoven was the fundamental to the company's long standing success.
From 1996 the Gaussian Beam and Shaped Beam lithography businesses were part of Leica Microsystems. They have been operating under the Vistec branch since 2005.
1962 | |
Electron Beam Lithography Group of Philips Eindhoven introduces the first commercial Gaussian Beam System EBM1 |
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1966 | |
Start of Electron Beam Technology within Cambridge Instruments Ltd. | |
1966-1971 | |
UK Government Research Contract with Cambridge Instruments and Cambridge University |
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1972 | |
Philips Eindhoven launches EBM4 | |
1973 | |
Philips Eindhoven starts successful EBPG series |
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1974 | |
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1976 | |
Cambridge Instruments launches EBMF2 | |
1978 | |
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1980 | |
Cambridge Instruments |
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1984 | |
Carl Zeiss Jena |
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1985 | |
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1987 | |
Carl Zeiss launches ZBA21 |
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1988 | |
Philips Eindhoven launches EBPG4HR |
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1989 | |
Merger of Philips E-Beam Group & Cambridge Instruments becomes part of Leica under the name Leica Cambridge Ltd. |
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1990 | |
Leica Service & Technical Support Center in Best, |
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After Germany's reunification the succssesful |
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1993 | |
Introduction of the first 300mm precision vacuum stage by Jenoptik |
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1995 | |
Leica Cambridge Ltd. introduces the first Vector Beam system VB5 |
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1996 | |
Leica Cambridge Ltd. and Jenoptik Lithography join and become Leica Lithography System. |
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1998 | |
Leica Microsystems launches EBPG500 |
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2000 | |
Leica Microsystems launches ZBA320 |
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2001 | |
Leica Microsystems launches EBPG5000plus series |
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2004 | |
Leica Microsystems launches VB300 |
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Leica Microsystems launches SB351 |
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2005 | |
Leica Microsystems Lithography becomes Vistec Electron Beam Lithography Group consisting of Vistec Lithography Inc. (Cambridge) and Vistec Electron Beam GmbH (Jena) |
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2006 | |
Vistec launches SB250 |
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Vistec launches SB3050 |
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2007 | |
Vistec's Gaussian Beam business was transfered to Watervliet, New York |
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2008 | |
Vistec Electron Beam launches SB3055 | |
2009 | |
Vistec launched the new EPBG5200 |
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2010 | |
vacuum compatible air-bearing based positioning system launched |
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