Vistec provides leading edge technology solutions for electron-beam lithography

History

The company roots go back to Carl Zeiss Jena and Cambridge Instruments and their long and successful histories. Back in the 1950's both Carl Zeiss Jena in Germany as well as Cambridge Instruments started projects for the development of commercial electron-beam equipment.

In 1974, the first commercial Shaped Beam system was launched based on fundamental patents still held by Vistec. With regard to Gaussian Beam, Cambridge Instruments Ltd. and its strong partnership with Cambridge University as well as to the Electron Beam Lithography Group of Philips Eindhoven was the fundamental to the company's long standing success.

From 1996 the Gaussian Beam and Shaped Beam lithography businesses were part of Leica Microsystems. They have been operating under the Vistec branch since 2005.



1974

  • Carl Zeiss Jena launches the first commercial Shaped Beam system

1978

  • Carl Zeiss Jena launches ZBA10

1984

  • Carl Zeiss Jena launches ZBA20

1987

  • Carl Zeiss launches ZBA21

1990

  • After Germany's reunification the succssesful Carl Zeiss spin-off Jenoptik takes over Carl Zeiss Lithography business

1993

  • Introduction of the first 300mm precision vacuum stage by Jenoptik

1995

  • Jenoptik launches ZBA31

 

1996

  • Leica Cambridge Ltd. and Jenoptik Lithography join and become Leica Lithography System.

2000

  • Leica Microsystems launches ZBA320

2004

  • Leica Microsystems launches  SB351

2005

  • Leica Microsystems Lithography becomes Vistec Electron Beam Lithography Group

2006

  • Vistec launches SB250

  • Vistec launches SB3050

2008

  • Vistec Electron Beam launches SB3055

2010

  • vacuum compatible air-bearing based positioning system launched

 

 

2011

  • Vistec launches SB4050