Vistec Electron Beam GmbH is a leader in the design and manufacture of electron-beam lithography systems. The company provides systems to both key semiconductor manufacturers as well as Advanced Research.
The application areas span a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, advanced research, integrated optics and several new emerging markets.
The company provides Variable Shaped Beam lithography systems and is located in Jena, Germany. In addition to their production facility in Germany, Vistec Electron Beam maintains service and support centres in Europe, China and Taiwan.
Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents. Further milestones are the introduction of the first 300mm precision vacuum stage in 1993, the first demonstration of a fully exposed 300mm silicon wafer in 1997 and, in 2001, the implementation of distributed computing by the help of cluster hardware for data preparation.
Thanks to its location, Vistec Electron Beam benefits from the synergies between leading edge research institutes, small and mid-sized equipment and supplier companies as well as key semiconductor manufacturers in the neighborhood area. Close cooperation with Jena´s Friedrich-Schiller-University, the Fraunhofer Institute for Optics and Precision Mechanics, the Ernst-Abbe-University of Applied Sciences in Jena, the Technical University Ilmenau as well as with companies like Jenoptik and Zeiss, provides excellent fundamentals for the prosperous development and further expansion of Vistec Electron Beam.