Shaped Beam
Optics
Gratings
Near IR Spectrometer Grating,
155 mm x 205 mm
System: Vistec SB350 OS
Source: Fraunhofer IOF, Germany
Security
Hologram
System: Shaped Beam Series
Source: Computer Holography Center, Russia
Grating
Encoder Ring
System: Vistec SB3XX Series
Source: Vistec Electron Beam GmbH, Germany
EBDW | Nano Imprint |
Early Device Evaluation
32 nm hp Device Cell Exposure
System: Vistec SB3054
Source: CEA-LETI, France
Cell Projection
Cell Projection using 1.5 μm x 0.75 μm cell size
System: Vistec SB3054
Source: STMicroelectronics, CEA-LETI, France
Semiconductor
Logic Device, 90 nm Pillars on top of 120nm Lines (Quarz Template)
System: Vistec SB352 HR
Source: IMS Chips, Germany
Mask writing | Nano Lithography |
Mask Patterning
Mask Patterning up to 9 inch
System: Vistec SB3XX Series
Source: Photronics MZD GmbH, Germany
Mask Patterning
Multi level OPC mask
System: Vistec SB3XX Series
Source: Photronics MZD GmbH, Germany
Resolution Capability
Line Width 12 nm (HSQ)
System: Vistec SB3050
Source: Vistec, Germany
Compound Semiconductor |
III-V Device
T-Gate (Device Sample)
System: Vistec SB250
Source: WIN Semiconductors Corp., Taiwan
III-V Materials
SiC 100mm wafer Sample
System: Shaped Beam Series
Source: Vistec, Germany
