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History

Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents. 

Further milestones are the introduction of the first 300mm precision vacuum stage in 1993, the first demonstration of a fully exposed 300mm silicon wafer in 1997 and, in 2001, the implementation of distributed computing by the help of cluster hardware for data preparation.

Important Milestones

2015

Vistec opens Showroom with Variable Shaped Beam System in Schaumburg, Illinois USA

2014

Vistec SB254

2012

New Ownership: Vistec Electron Beam GmbH, Jena

2011

Vistec SB3055

2008

Vistec SB3050

2006

Vistec SB250

2005

Leica Microsystems Lithography GmbH becomes Vistec Electron Beam GmbH

2004

Leica Microsystems SB351

2000

Leica Microsystems ZBA32

1996

Leica Cambridge Ltd. and Jenoptik Lithography join and the company in Jena becomes Leica Lithographie Systeme Jena GmbH.

1995

Jenoptik ZBA31

1993

Introduction of the first 300mm precision vacuum stage by Jenoptik

1990

After Germany's reunification the successful Carl Zeiss spin-off Jenoptik takes over Carl Zeiss Lithography business

1987

Carl Zeiss Jena ZBA21

1984

Carl Zeiss Jena ZBA20

1978

Carl Zeiss Jena ZBA10

1974

Carl Zeiss Jena launches the first commercial Variable Shaped Beam system