Gaussian Beam
Nano Lithography
Sensing Devices
Split-Ring Resonators,
Line Width 40-45 nm, Tall 450 nm
System: Vistec EBPG5000pES
Source: PSI, Switzerland
Resolution Capability
6nm Line / 8nm half-pitch (HSQ)
System: Vistec VB300
Source: CNSE, USA
Resolution Demonstration
5 nm Line Width / 20 nm Pitch (HSQ)
System: Vistec EBPG5000plus
Source: TU Delft, The Netherlands
Optics
X-Ray Optics
Zone Lens: 25 nm half-pitch Gold zones
System: Vistec EBPG5000pES
Source: Helmholtz Zentrum Berlin, Germany
Integrated Photonics
Circular Grating Resonator
System: Vistec EBPG5000
Source: AMO GmbH, Germany
Telecommunications
Tuneable Laser Array
System: Vistec EBPG5000plus
Source: Santur Corp., USA
Compound Semiconductor
III-V Device
Transistor (Sample)
System: Vistec EBPG Series
Source: Vistec, USA
Nano Imprint
Semiconductor
Synthetic Memory Device, 35 nm Line (Template)
System: Vistec VB6
Source: Molecular Imprints Inc., USA![]()
EBDW
Semiconductor Research
Vertical Resonant Tunnel Transistor
System: Vistec EBPG5000plus
Source: Forschungszentrum Jülich, Germany

