Gaussian Beam and Shaped Beam systems from Vistec for all areas of advanced electron-beam lithography

Gaussian Beam

Nano Lithography

Sensing Devices

Split-Ring Resonators,
Line Width 40-45 nm, Tall 450 nm
System: Vistec EBPG5000pES
Source: PSI, Switzerland

Resolution Capability

6nm Line / 8nm half-pitch (HSQ)
System: Vistec VB300

Source: CNSE, USA


Resolution Demonstration

5 nm Line Width / 20 nm Pitch (HSQ)
System:
Vistec EBPG5000plus

Source: TU Delft, The Netherlands

 

Optics

X-Ray Optics

Zone Lens: 25 nm half-pitch Gold zones
System: Vistec EBPG5000pES
Source: Helmholtz Zentrum Berlin, Germany

Integrated Photonics

Circular Grating Resonator
System:
Vistec EBPG5000
Source: AMO GmbH, Germany

Telecommunications

Tuneable Laser Array
System: Vistec EBPG5000plus

Source: Santur Corp., USA


Compound Semiconductor

III-V Device

Transistor (Sample)
System: Vistec EBPG Series
Source: Vistec, USA



Nano Imprint

Semiconductor

Synthetic Memory Device, 35 nm Line (Template)
System: Vistec VB6
Source: Molecular Imprints Inc., USA

EBDW

Semiconductor Research

Vertical Resonant Tunnel Transistor
System: Vistec EBPG5000plus
Source: Forschungszentrum Jülich, Germany