Vistec EBPG5000plus Series

Overview

The Vistec EBPG5000plus Series are a further evolution of the EBPG4 and 5 systems. The EBPG series has established a worldwide position for advanced nano-lithography applications, particularly in direct writing of both R&D and production GaAs devices.

As a cost effective entry system to the high-end nano-lithography market and retaining the core features of the full EBPG5000plus system the EBPG5000plusES was designed. A structured up-grade policy enables the system to be adapted to future application requirements.

Key Features

• high current density Thermal Field Emission gun for operation
  at 20, 
50 and 100kV
• availability of 150mm platform
• minimum feature size of less than 8nm
• rapid exposure with 25 or 50MHz pattern generator
• Continuously variable large field size operation to 1mm at all kVs
• GUI for ease of use operation for diverse "multi user environment"
• flexible configuration packages to ensure best fit with application requirements