Vistec EBPG5200 Series

Overview

The Vistec EBPG5200 Series is a further evolutionary progression of Vistec's high-end electron-beam lithography systems now providing full 200mm wafer writing performance.

The NEW system is available alongside the successful and field proven 150mm platform in the EBPG5000plus Series. The various products have been designed to meet the diverse requirements for both direct write nano-lithography and R&D mask making in Universities and Centers of Excellence.



The modular system architecture allows the adaptation of the system configuration to specific customer requirements along with a structured upgrade strategy enabling a path for tracking future technology trends as well as protecting the customer's initial system investment.

Key Features

• high current density Thermal Field Emission gun for operation
  at 20, 
50 and 100kV
• availability of 200mm platform
• minimum feature size of less than 8nm
• rapid exposure with 25 or 50MHz pattern generator
• Continuously variable large field size operation to 1mm at all kVs
• GUI for ease of use operation for diverse "multi user environment"
• flexible configuration packages to ensure best fit with application requirements