Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating

2010

Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping

2009

Minimizing linewidth roughness for 22-nm node patterning with step-and-flash imprint lithography
SPIE 2008

A photonic nano-Bragg grating device integrated with microfluidic channels for bio-sensing applications
MNE 2008

Nanofabrication of high aspect ratio 24nm X-ray zone plates for X-ray imaging applications
EIPBN 2007

Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers
2007

Measurement of Arrays of Dots Produced by Electron-beam Lithography
2006

Sub-10-nm high aspect ratio patterning of ZnO in a 500 m main field
2006

Sub-10nm High-Aspect-Ratio Patterning of ZnO using an Electron Beam
2005

Repair of step and flash imprint lithography templates
2004

Sub-10 nm linewidth and overlay performance achieved with afine-tuned EBPG-5000 TFE electron beam lithography system
2000

E-Beam lithography on transparent substrates: challenges and results 

IMS Workshop 2011

Latest results and computing performance of the ePLACE data preparation tool
SPIE 2009

Polarization-independent negative-index metamaterial in the near infrared
Optical Society of America 2009

A Solution to Meet New Challenges on EBDW Data Prep
EMLC 2009

High Resolution Cell Projection
ELMC 2009

Optimization of BSE-Detectors for E-Beam Direct Write Lithography
SPIE 2009

E-beam direct write alignment strategies for the next generation node
SPIE 2008

3D Template fabrication process for the Dual Damascene NIL approach
SPIE 2007