Gaussian Beam and Shaped Beam systems from Vistec for all areas of advanced electron-beam lithography

Technologies

Gaussian Beam Lithography


Vistec`s Gaussian Beam systems, which are characterized by a 2nm spot size at 100keV acceleration voltage, are the system of choice for nanotechnology and the most advanced research applications. Gaussian Beam systems made by Vistec are installed in most of the leading edge universities and industry research laboratories all over the world. Further, these Gaussian Beam systems are widely used in the compound semiconductor industry.

Vistec EBPG5200 Series
Vistec EBPG5000plus Series

Shaped Beam Lithography


Vistec`s Variable Shaped Beam systems are the most advanced systems for electron-beam direct write in terms of throughput, accuracy and automation. This is where Vistec currently holds a leading market position. The specific architecture of the 50keV systems offers high resolution patterning down to 32nm technology node and enables their use in fast prototyping, design evaluation and small volume production. Besides direct write applications, shaped beam systems from Vistec are also used for mask making applications.

Vistec SB3050 Series
Vistec SB250 Series
Vistec SB351