Technologies

Shaped Beam Lithography

Vistec`s Variable Shaped Beam systems are the most advanced systems for electron-beam direct write in terms of throughput, accuracy and automation. This is where Vistec currently holds a leading market position. The specific architecture of the 50keV systems offers high resolution patterning down to 32nm technology node and enables their use in fast prototyping, design evaluation and small volume production. Besides direct write applications, shaped beam systems from Vistec are also used for mask making applications.

Vistec SB3050 / SB4050 Series
Vistec SB250 Series
Vistec SB351