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E-Beam.
Flexible e-beam solutions for
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Nano Lithography

Resolution Capability

Line Width 12 nm (HSQ)
System: Vistec SB3050
Source: Vistec, Germany

Plasmonic Nanostructures

SERS-Substrate 200 nm grating pitch
System: Vistec SB350 OS
Source: IPHT Jena, Germany