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Leading technology solutions
for advanced electron-beam lithography


San Jose, USA

Get the latest research at SPIE Advanced Lithography + Patterning in San Jose

The conference dates are: April 24th until 28th, the exhibition is from April 26th until April 27th 2022.

Topics ranging from optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications


  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning