Technical Papers

Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography

JM3 Vol.22 Issue 04/2023

Electron beam direct write lithography: the versatile ally of optical lithography

JM3 Vol.22 Issue 04/2023

Efficient exposure of non-Manhattan layouts using Vistec’s shaped beam systems

SPIE AL 2023

New Data Prep Solutions for the Exposure of Non-Manhattan Structures with Vistec VSB E-Beam Writers

Beams & More 2022

Optical metasurfaces fabricated by electron-beam lithography with cell projection

MNE 2022

Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach

EMLC 2022

Optical metasurfaces made by cell projection lithography

PhotonicsViews 05 2022

Novel 1064 nm DBR lasers combining active layer removal and surface gratings

The Institution of Engineering and Technology 2021

Surface enhanced Raman spectroscopy-based evaluation of the membrane protein composition of the organohaliderespiring Sulfurospirillum multivorans

Analytical Science Journals Online Library Wiley 2021

Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration

MNE 2020

Hybrid E-beam lithography and process improvement for nanodevice fabrication

Photomask Technology 2020

Integrated photonic guided metalens based on a pseudo-graded index distribution

Sci Rep 10, 3770 in 2020

Surface Bragg gratings for high brightness lasers

SPIE OPTO 2020

Continuous-wave operation of DFB laser diodes based on GaN using 10th-order laterally coupled surface gratings

Optics Letters Vol. 45/Issue 4, 2020

Diffuse scattering of lamellar optical gratings due to line edge roughness

SPIE Optical Systems Design 2018

Micrometer to 15nm Printing of Metallic inks with fountain pen lithography

Small 14, 1702324-1 2018

Approach to combine electron-beam lithography and two-photon polymerization for enhanced nano-channels in network-based biocomputation devices

EMLC 2018

Reflectors and tuning elements for widely-tunable GaAs-based sampled grating DBR lasers

SPIE OPTO 2018

Development of the flight models for the Sentinel-4/UVN NIR-grating unit

SPIE AL 2017

Challenges of nanostructure-integration in Fabry-Pérot interferometers as alternative to Bragg reflectors

EMLC 2017

Advanced photomask fabrication by e-beam lithography for mask aligner applications

EMLC 2016

Investigation and optimization of Rowland ghosts in high efficiency spectrometer gratings fabricated by e-beam lithography

SPIE Opto 2016

Design and fabrication of titanium dioxide wire grid polarizer for the far ultraviolet spectral range

SPIE 2016

Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2 & Cr

SPIE AL 2015

Low-crosstalk fabrication-insensitive echelle grating demultiplexers on Silicon-on-Insulator

SPIE Photonics West 2015

Integration of E-Beam Direct Write in BEOL processes of 28nm SRAM technology node using Mix & Match

EMLC 2014

Resolution enhancement for advanced aligner lithography using phase-shifting photomasks

ODS 2014

Fabrication technology of GaN/AlGaN HEMT slanted sidewall gates using thermally reflowed ZEP resist and CHF3/SF6 plasma etching

CS Mantech 2013

Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance

SPIE 2013

Polarization-independent negative-index metamaterial in the near infrared

Optical Society of America 2009

A Solution to Meet New Challenges on EBDW Data Prep

EMLC 2009

Optimization of BSE-Detectors for E-Beam Direct Write Lithography

SPIE 2009

E-beam direct write alignment strategies for the next generation node

SPIE 2008

3D Template fabrication process for the Dual Damascene NIL approach

SPIE 2007

Hahmann, Peter "Jenaer Arbeiten zur Elektronenstrahl-Lithographie"

Jena 2014, Vopelius Verlag

Hahmann, Peter "Electron Beam Lithography Contributions from Jena"

Jena 2014, Vopelius Verlag