Electron-beam lithography has long been established as a very flexible and reliable technology for a wide range of existing as well as emerging semiconductor and nanotechnology applications.
This is not only true in research and development but also in semiconductor manufacturing. It is a proven technology in the manufacturing of semiconductor devices, for the generation of masks for optical lithography as well as for electron-beam direct write.
With regard to optics high resolution nano-patterning has a huge potential for the generation and implementation of novel optical functions. In the following some exclusive examples are highlighted.