Overview

The Vistec Electron Beam Lithography Group is a world leader in the design and manufacture of electron beam lithography systems and provides leading edge technology solutions for a wide range of applications.

The Group provides systems to both key semiconductor manufacturers as well as to Universities and Centres of Excellence. The application areas span a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, advanced research, integrated optics and several new emerging markets.

In addition to production facilities in Germany and the US, the Group also maintains service and support centres in the USA, Europe, China, Japan, Taiwan and Korea.

The Vistec Electron Beam Lithography Group consists of two companies / business units: Vistec Electron Beam GmbH, which produces Variable Shaped Beam Lithography systems - located in Jena, Germany and Vistec Lithography Inc., manufacturing Gaussian Beam Lithography systems - located in Watervliet, NY, USA.

The two companies in Jena, Germany and Watervliet, USA, benefit from the synergies between leading edge researchers, small and midsized equipment and supplier companies and key semiconductor manufacturers in their neighbouring areas. They have a excellent record as experienced developers and manufacturers of electron beam lithography systems.

The company`s roots go back to Carl Zeiss Jena and Cambridge Instruments in the 1960s. Since that time, a team of highly motivated employees, excellent researchers and engineers have worked hard to always ensure the outstanding performance of our electron-beam lithography systems, thus fulfilling the challenging requirements of our customers.