EBDW
Qubits
Silicon-based Qubits; 80nm pitch
System: Vistec SB3050 DW
Source: Fraunhofer IPMS CNT, Germany
Cell Projection
Cell Projection using 1.5 μm x 0.75 μm cell size
System: Vistec SB3054
Source: STMicroelectronics, CEA-LETI, France
Early Device Evaluation
32 nm hp Device Cell Exposure
System: Vistec SB3054
Source: CEA-LETI, France
Gate Manufacturing
Gate manufacturing by HSQ lithography; CD: 8nm
System: Vistec SB3054
Source: CEA-LETI, France
300mm CMOS FCP
FCP- full chip patterning / Integration into 28nm BEOL SRAM technology
System: Vistec SB3050
Source: Fraunhofer IPMS CNT, Germany