Our History

The company's roots go back to Carl Zeiss Jena in the early 1970s, when the first commercial electron-beam exposure system based on the VSB principle was introduced. The main customers for the so-called ZBAs (Zeiss exposure system) were the former RGW (Rat für gegenseitige Wirtschaftshilfe - Council for Mutual Economic Assistance) countries. After the political changes in Germany, electron beam lithography was initially continued under the roofs of JENOPTIK and later Leica Microsystems. Since 1996, Leica Electron Beam Lithography has been operating as a limited liability company (GmbH). As a result of a restructuring process in 2006 the company had to change the name in Vistec Electron Beam. Since 2012 Vistec Electron Beam GmbH is a wholly owned subsidiary of DR.-JOHANNES-HEIDENHAIN.

The company employs more than 110 people worldwide. The headquarter is located in Jena, Germany, with offices and manufacturing facilities for assembly and qualification. In addition to their production facility in Germany, Vistec maintains service and support centres in Europe, China, Taiwan and also in the US.

Thanks to its location, Vistec Electron Beam benefits from the synergies between leading edge research institutes, small and mid-sized equipment and supplier companies as well as key semiconductor manufacturers in the neighborhood area.

Vistec is certified by DIN EN ISO 9001:2015.