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E-Beam. Flexible e-beam solutions for
a huge variety of applications

Nano Imprint

Semiconductor

Teaserimage Semiconductor

Pillars Ø 500 nm, h: 1.5 μm on 15 μm pedestal
System: Vistec SB352 HR
Source: IMS Chips, Germany

Optics

Nano-Imprint Master for optical Metasurface
System: Vistec SB350 OS
Source: Fraunhofer IOF, Germany