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Proximity Effect Correction Solution

The PROXECCO software package offers leading edge proximity effect correction for electron beam lithography. Its performance is proven in advanced research as well as industrial manufacturing environments.

High resolution electron beam lithography for mask writing as well as direct write application requires accurate proximity effect corrections and precise process adaptations. These corrections may be performed as dose modulations or shape corrections and are described by a point spread function (PSF).

Proximity Effect Correction Solution

PROXECCO can utilize an N-Gaussian analytical function or a pointwise function to describe the PSF. The PSF parameters can be quantified using Monte Carlo simulations or experimental data which may account for process related effects also.

PROXECCO supports process related corrections (LES) and contrast enhancement (GIDC) as well as shot and write time optimized fracture strategies.

PROXECCO provides a consistent interface for the integration into data preparation software packages for electron beam lithography.

Key Features

  • Distributed computing for fast data processing
  • Shot optimized fracture
  • Dose assignment strategy for write time optimization and contrast enhancement
  • Automatic tracing of correction quality
  • Flexible license policy


  • Line End Shortening correction (LES)
  • Geometrical Induced Dose Correction (GIDC)
  • Application support

For more information about PROXECCO please contact us!

Currently integrated in data preparation packages ePLACE™ (supported by EQUIcon Software GmbH) and CATS™ (licensed by Synopsys Inc.). 
PROXECCO™ is a registered trademark of Vistec Electron Beam GmbH.