Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.
Further milestones are the introduction of the first 300mm precision vacuum stage in 1993, the first demonstration of a fully exposed 300mm silicon wafer in 1997 and, in 2001, the implementation of distributed computing by the help of cluster hardware for data preparation.
Vistec SB3050-2, 300mm
Vistec opens Showroom with Variable Shaped Beam System in Schaumburg, Illinois USA
Vistec SB254, 200mm
New Ownership for Vistec Electron Beam GmbH, Jena
Leica Microsystems Lithography GmbH becomes Vistec Electron Beam GmbH
Leica Microsystems SB351
Leica Microsystems ZBA32
Leica Cambridge Ltd. and Jenoptik Lithography join and the company in Jena becomes Leica Lithographie Systeme Jena GmbH.
Introduction of the first 300mm precision vacuum stage by Jenoptik
After Germany's reunification the successful Carl Zeiss spin-off Jenoptik takes over Carl Zeiss Lithography business
Carl Zeiss Jena ZBA21
Carl Zeiss Jena ZBA20
Carl Zeiss Jena ZBA10
Carl Zeiss Jena launches the first commercial Variable Shaped Beam system