History

Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.

Further milestones are the introduction of the first 300mm precision vacuum stage in 1993, the first demonstration of a fully exposed 300mm silicon wafer in 1997 and, in 2001, the implementation of distributed computing by the help of cluster hardware for data preparation.

Important Milestones

2021
Rebranding
2019
Vistec SB3050-2, 300mm
2015
Vistec opens Showroom with Variable Shaped Beam System in Schaumburg, Illinois USA
2014
Vistec SB254, 200mm
2012
New Ownership for Vistec Electron Beam GmbH, Jena
2011
Vistec SB3055
2008
Vistec SB3050
2006
Vistec SB250
2005
Leica Microsystems Lithography GmbH becomes Vistec Electron Beam GmbH
2004
Leica Microsystems SB351
2000
Leica Microsystems ZBA32
1996
Leica Cambridge Ltd. and Jenoptik Lithography join and the company in Jena becomes Leica Lithographie Systeme Jena GmbH.
1995
Jenoptik ZBA31
1993
Introduction of the first 300mm precision vacuum stage by Jenoptik
1990
After Germany's reunification the successful Carl Zeiss spin-off Jenoptik takes over Carl Zeiss Lithography business
1987
Carl Zeiss Jena ZBA21
1984
Carl Zeiss Jena ZBA20
1978
Carl Zeiss Jena ZBA10
1974
Carl Zeiss Jena launches the first commercial Variable Shaped Beam system