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E-Beam.
Leading technology solutions
for advanced electron-beam lithography

History

Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents. 

Further milestones are the introduction of the first 300mm precision vacuum stage in 1993, the first demonstration of a fully exposed 300mm silicon wafer in 1997 and, in 2001, the implementation of distributed computing by the help of cluster hardware for data preparation.

Important Milestones

  • 2015

    Vistec opens Showroom with Variable Shaped Beam System in Schaumburg, Illinois USA

  • 2014

    Vistec SB254

  • 2012

    New Ownership: Vistec Electron Beam GmbH, Jena

  • 2011

    Vistec SB3055

  • 2008

    Vistec SB3050

  • 2006

    Vistec SB250

  • 2005

    Leica Microsystems Lithography GmbH becomes Vistec Electron Beam GmbH

  • 2004

    Leica Microsystems SB351

  • 2000

    Leica Microsystems ZBA32

  • 1996

    Leica Cambridge Ltd. and Jenoptik Lithography join and the company in Jena becomes Leica Lithographie Systeme Jena GmbH.

  • 1995

    Jenoptik ZBA31

  • 1993

    Introduction of the first 300mm precision vacuum stage by Jenoptik

  • 1990

    After Germany's reunification the successful Carl Zeiss spin-off Jenoptik takes over Carl Zeiss Lithography business

  • 1987

    Carl Zeiss Jena ZBA21

  • 1984

    Carl Zeiss Jena ZBA20

  • 1978

    Carl Zeiss Jena ZBA10

  • 1974

    Carl Zeiss Jena launches the first commercial Variable Shaped Beam system